Process - Induced inhomogeneities in higher asymmetry angle X-ray monochromators (Articolo in rivista)

Type
Label
  • Process - Induced inhomogeneities in higher asymmetry angle X-ray monochromators (Articolo in rivista) (literal)
Anno
  • 2013-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1117/12.2025142 (literal)
Alternative label
  • Korytár, Dusan; Vagovic, Patrik; Ferrari, Claudio; Shiffalovic, Peter; Jergel, Matej; Dobrocka, Edmund; Záprazný, Zdenko; Ác, Vladimír; Mikulík, Petr (2013)
    Process - Induced inhomogeneities in higher asymmetry angle X-ray monochromators
    in Proceedings of SPIE, the International Society for Optical Engineering; SPIE-INT SOC OPTICAL ENGINEERING, BELLINGHAM, WA 98227-0010 (Stati Uniti d'America)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Korytár, Dusan; Vagovic, Patrik; Ferrari, Claudio; Shiffalovic, Peter; Jergel, Matej; Dobrocka, Edmund; Záprazný, Zdenko; Ác, Vladimír; Mikulík, Petr (literal)
Pagina inizio
  • 88480U-1 (literal)
Pagina fine
  • 88480U-8 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://www.scopus.com/record/display.url?eid=2-s2.0-84888866169&origin=inward (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 8848 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 8 (literal)
Note
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Institute of Electrical Engineering Slovak Academy of Sciences; Tohoku University; Consiglio Nazionale delle Ricerche; Institute of Physics Slovak Academy of Sciences; A. Dub?ek University of Tren?ín; Masaryk University (literal)
Titolo
  • Process - Induced inhomogeneities in higher asymmetry angle X-ray monochromators (literal)
Abstract
  • Beam inhomogeneities of asymmetric Ge(220)-based V-shaped and single bounce monochromators have been studied both in metrological and imaging applications for photon energies around 8 keV. Presence of growth striations in graded GeSi, grains in single Cu crystal, and strains in thermally tuned V-channel monochromators observed in X-ray topographs excludes these materials from imaging applications. As for stochastic surface processing, chemomechanical polishing (CMP) produces better surface homogeneity than chemical polish. However, CMP is more difficult to be applied in V-channels, where chemical polishing is prefered. For comparison, measurements on surfaces processed by a deterministic mechanical method of single point diamond turning (SPDT) have shown SPDT to be a perspective technology. Again, to prepare deep grooves with this technique is also a challenge, mainly for tool makers. Some process induced features are observed as wavefield distortions in interference fringes. © 2013 SPIE. (literal)
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