An MOCVD route to barium borate thin films from a barium hydro-tri(1-pyrazolyl)borate single-source precursor (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• An MOCVD route to barium borate thin films from a barium hydro-tri(1-pyrazolyl)borate single-source precursor (Articolo in rivista) (literal)

Anno

• 2007-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1002/cvde.200706611 (literal)

Alternative label

• Malandrino, G; Lo Nigro, R; Fragala, IL (2007)
  An MOCVD route to barium borate thin films from a barium hydro-tri(1-pyrazolyl)borate single-source precursor
  in Chemical vapor deposition (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Malandrino, G; Lo Nigro, R; Fragala, IL (literal)

Pagina inizio

• 651 (literal)

Pagina fine

• 655 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 13 (literal)

Rivista

• Chemical vapor deposition (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 5 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• [Malandrino, Graziella; Fragala, Ignazio L.] Univ Catania, Dipartimento Sci Chim, INSTM, UdR Catania, I-95125 Catania, Italy; [Lo Nigro, Raffaella] CNR, Ist Microelect Microsistemi, IMM, I-95127 Catania, Italy (literal)

Titolo

• An MOCVD route to barium borate thin films from a barium hydro-tri(1-pyrazolyl)borate single-source precursor (literal)

Abstract

• BaB2O4 thin films are deposited by metal-organic (MO)CVD using the barium(II) hydro-tri(1-pyrazolyl)borate, Ba[BH(PZ)(3)](2), complex, that is tested for the first time as a single-source precursor for the deposition of barium borate films. The related thermal analysis data reveal good volatility and high thermal stability with a low residue upon sublimation, despite the relatively high melting point (298.2 degrees C). Different BaB2O4 phases can be obtained depending on deposition temperatures. Films, deposited on Al2O3 (0001) substrates, are structurally and morphologically characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS). (literal)

Prodotto di

• Materiali multifunzionali, e innovativi per componenti integrati (MD.P05.003.002) (Modulo)
• Institute for microelectronics and microsystems (IMM) (Istituto)

Autore CNR

• RAFFAELLA LO NIGRO (Unità di personale interno)

Insieme di parole chiave

• Keywords of "An MOCVD route to barium borate thin films from a barium hydro-tri(1-pyrazolyl)borate single-source precursor" (Insieme di parole chiave)

Incoming links:

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Materiali multifunzionali, e innovativi per componenti integrati (MD.P05.003.002) (Modulo)

Autore CNR di

• RAFFAELLA LO NIGRO (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Chemical vapor deposition (Rivista)

Insieme di parole chiave di

• Keywords of "An MOCVD route to barium borate thin films from a barium hydro-tri(1-pyrazolyl)borate single-source precursor" (Insieme di parole chiave)