Applied physics express

Label

• Applied physics express (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Ab initio study of Ge intercalation in epitaxial graphene on SiC(0001) (Articolo in rivista) (Prodotto della ricerca)
• Microwave Annealing of Very High Dose Aluminum-Implanted 4H-SiC (Articolo in rivista) (Prodotto della ricerca)
• Effects of Thermal Treatments on the Trapping Properties of HfO2 Films for Charge Trap Memories (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Alternative label

• Applied physics express. (literal)
• APEX (literal)
• Appl. phys. express (literal)

Language

• eng (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#issn

• 1882-0786 (literal)

Preferred label

• Applied physics express (literal)

Publisher

• Japan Society of Applied Physics [Tokyo] : JPN (literal)

Incoming links:

Rivista

• Effects of Thermal Treatments on the Trapping Properties of HfO2 Films for Charge Trap Memories (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
• Microwave Annealing of Very High Dose Aluminum-Implanted 4H-SiC (Articolo in rivista) (Prodotto della ricerca)
• Ab initio study of Ge intercalation in epitaxial graphene on SiC(0001) (Articolo in rivista) (Prodotto della ricerca)